Abstract
ESD protection design for mixed-voltage I/O interfaces with the low-voltage-triggered PNP (LVTPNP) devices is proposed in this paper. The LVTPNP, by inserting N+ or P+ diffusion across the junction between N-well and P-substrate of the PNP devices, is designed to protect the mixed-voltage I/O pads for signals with voltage levels higher than VDD (over-VDD) and lower than VSS (under-VSS). The experimental results in a 0.35-?m CMOS process have proven that the ESD level of the proposed LVTPNP is higher than that of the traditional PNP device.